|
The Sources of
Innovation
by Hippel Von, Eric A Von
Hippel
Reaction and target design
options for neutron source for neutron teletherapy
L Cranberg 1972 Phys.
Med. Biol. 17
881 doi:10.1088/0031-9155/17/6/064
Evolution of integrated-circuit vacuum processes:
1959–1975
Robert
K. Waits
Sunnyvale,
California 94087-4426
or
Microwave spectroscopy of
high-L Rydberg states of neon
R. F. Ward, Jr.
Department
of Physics, University of Notre Dame, Notre Dame, Indiana
46556
W. G. Sturrus
Department
of Physics, Youngstown State University, Youngstown, Ohio
44555
S. R. Lundeen
Department
of Physics, Colorado State University, Ft. Collins, Colorado
80523
| Ion implantation in
silicon technology |
|
Leonard Rubin and John Poate
|
Concept, operation and performance of the veeco VHC-120
high current ion implanter
William Scaife, Dennis Wagner and William Faul
Veeco Instruments, PO Box 17068, Austin, TX
78760, USA
Abstract
Veeco has developed, and is manufacturing, a new
120 keV high current ion implanter. The VHC-120 is
characterized by a high degree of automation, including total
computer control. A new, fixed focused beamline technology
permits a small physical size. Improved vacuum systems and a
unique dosimetry/scanning technique extend process control.
US Patents held by ai employees
Ozone generation apparatus and
method 1979-Orr, Templeton, Keutzer
Ozone generation apparatus and
method 1978-Orr, Templeton, Keutzer
Method and apparatus for extracting well-formed,
high current ion beams from a plasma
source 1976-Robinson, Seliger
Automatic end station for ion implantation
system 1976-Templeton, Gault
Ion implantation control
system 1985-Gault, Keutzer
| 
